| 发明名称 |
CHAMBER COMPONENT WITH FLUORINATED THIN FILM COATING |
| 摘要 |
A chamber component comprises a body and a fluorinated thin film protective layer over at least one surface of the body. The fluorinated thin film protective layer does not react with process gasses having Fluorine based chemistry. The fluorinated thin film protective layer may be a YF3 layer. |
| 申请公布号 |
US2015311043(A1) |
申请公布日期 |
2015.10.29 |
| 申请号 |
US201514696085 |
申请日期 |
2015.04.24 |
| 申请人 |
Applied Materials, Inc. |
发明人 |
Sun Jennifer Y.;Firouzdor Vahid;Kanungo Biraja P.;Lubomirsky Dmitry;Kim Sung Je |
| 分类号 |
H01J37/32;C23C14/22;C23C14/46;C23C4/12 |
主分类号 |
H01J37/32 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A chamber component of an etch reactor comprising:
a body; and a fluorinated thin film protective layer over at least one surface of the body, wherein the fluorinated thin film protective layer does not react with process gasses having a Fluorine based chemistry. |
| 地址 |
Santa Clara CA US |
