PELLICLE FOR EUV LITHOGRAPHY AND METHOD OF FABRICATING THE SAME

摘要

Provided are a pellicle for EUV lithography, and a manufacturing method thereof. The pellicle for EUV lithography includes a plurality of holes, and is a porous thin film composed of a material having the extinction coefficient of 0.02 or less. The diameter of the hole is 1 μm or less. Accordingly, by using the porous thin film having the holes itself as the pellicle, a thick pellicle can be manufactured while having the higher EUV transmittance than a thin film-shaped pellicle, thereby ensuring the improved intensity.