| 摘要 |
PROBLEM TO BE SOLVED: To provide: a photosensitive resin composition which is cured with high sensitivity and whose unexposed part is alkali-developable; and a cured product thereof.SOLUTION: A photosensitive resin composition comprises (A) a photobase generator represented by the general formula (1) in the figure, (B) a curable resin, and (C) an alkali-developable resin. |
