SUBSTRATE PROCESSING METHOD, READABLE COMPUTER STORAGE MEDIUM, AND SUBSTRATE PROCESSING SYSTEM

摘要

In the present invention, a substrate processing method includes: forming a plurality of circular patterns using a resist film on a substrate; applying a first block copolymer; phase-separating the first block copolymer into a hydrophilic polymer and a hydrophobic polymer and then selectively removing the hydrophilic polymer; selectively removing the resist film from the substrate; applying a second block copolymer to the substrate; and phase-separating the second block copolymer into a hydrophilic polymer and a hydrophobic polymer and then selectively removing the hydrophilic polymer from the phase-separated second block copolymer. The proportions of the hydrophilic polymers in the first block copolymer and the second block copolymer by molecular weight are in the range 20-40%.