| 发明名称 |
NEGATIVE RESIST COMPOSITION, RESIST FILM USING SAME, PATTERN FORMING METHOD, AND MASK BLANK PROVIDED WITH RESIST FILM |
| 摘要 |
A negative resist composition includes an onium salt compound (A) containing a nitrogen atom in its cation moiety, a compound (B) that is configured to produce an acid when exposed to actinic rays or radiation, and a compound (C) containing an acid-crosslinkable group. |
| 申请公布号 |
US2015309408(A1) |
申请公布日期 |
2015.10.29 |
| 申请号 |
US201514794393 |
申请日期 |
2015.07.08 |
| 申请人 |
FUJIFILM Corporation |
发明人 |
TSUCHIMURA Tomotaka;YATSUO Tadateru |
| 分类号 |
G03F7/038;G03F1/50;G03F1/76;G03F7/20 |
主分类号 |
G03F7/038 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A negative resist composition comprising:
an onium salt compound (A) containing a nitrogen atom in its cation moiety, a compound (B) that is configured to produce an acid when exposed to actinic rays or radiation, and a compound (C) containing an acid-crosslinkable group. |
| 地址 |
Tokyo JP |
