发明名称 Inspection apparatus for lithography
摘要 A system detects targets located within patterns. It operates in the pupil plane by filtering the received signal from the surrounding pattern. A method includes illuminating a target and a surrounding pattern with radiation, detecting the radiation reflected by the target and the surrounding pattern and forming a first set of data based on the detected radiation, removing portions of the first set of data which correspond to the target to form reduced data, interpolating the remaining portions of the reduced data over the removed portions to form product data, and subtracting the product data from the first set of data to form target data.
申请公布号 IL209000(A) 申请公布日期 2015.10.29
申请号 IL20100209000 申请日期 2010.10.28
申请人 ASML NETHERLANDS B.V. 发明人
分类号 G01N;G03F 主分类号 G01N
代理机构 代理人
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