Exposure apparatus, exposure method, and method for producing device

摘要

An exposure apparatus (EX) for exposing a substrate (P) by projecting a pattern image onto the substrate through a liquid (LQ) in a liquid immersion area (AR2) formed locally on the substrate, the exposure apparatus comprising:
a projection optical system (PL) for projecting the pattern image onto the substrate;
a substrate stage (PST) having a substrate holder (PSH) for holding the substrate and which is movable while holding the substrate on the substrate holder;
a first detecting system (5) for detecting an alignment mark on the substrate held by the substrate stage not through the liquid; and
a second detecting system (6) for detecting a projection position of the image by using a reference (3) provided on the substrate stage through the liquid,
wherein:
the reference is covered with a light-transmissive material; and
the exposure apparatus is configured such that the projection position of the pattern image is detected through the liquid by using the second detecting system and the reference when the substrate or a dummy substrate is arranged on the substrate holder.