发明名称 METHOD FOR PRODUCING A WAVEFRONT-CORRECTED OPTICAL ARRANGEMENT COMPRISING AT LEAST TWO OPTICAL ELEMENTS
摘要 <p>The invention relates to a method for producing a wavefront-corrected optical arrangement comprising at least two optical elements. Using the method, a total wavefront error in the optical arrangement is determined and compared to a permissible tolerance range for the total wavefront error. To perform the method, the optical elements are individualized by assigning an individual identifier to each of them, such that individualized optical elements are obtained, individual surface defects are measured with correct coordinates on all the individualized optical elements and the measured individual surface defects are stored with correct coordinates assigned to the appropriate individualized optical element. The optical arrangement comprising the individualized optical elements is produced virtually as a virtual optical arrangement and a total wavefront error is calculated for the virtual optical arrangement.</p>
申请公布号 EP2936234(A1) 申请公布日期 2015.10.28
申请号 EP20130814828 申请日期 2013.12.13
申请人 JENOPTIK OPTICAL SYSTEMS GMBH 发明人 WERSCHNIK, JAN;AUGUSTIN, MARKUS
分类号 G02B27/00 主分类号 G02B27/00
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