发明名称 半導体装置及びその製造方法
摘要 According to one embodiment, a semiconductor device includes a semiconductor substrate having a first surface and a second surface, and having a LSI on the first surface of the semiconductor substrate, a first insulating layer with an opening, the first insulating layer provided on the first surface of the semiconductor substrate, a conductive layer on the opening, the conductive layer being connected to the LSI, and a via extending from a second surface of the semiconductor substrate to the conductive layer through the opening, the via having a size larger than a size of the opening in a range from the second surface to a first interface between the semiconductor substrate and the first insulating layer, and having a size equal to the size of the opening in the opening.
申请公布号 JP5802515(B2) 申请公布日期 2015.10.28
申请号 JP20110230008 申请日期 2011.10.19
申请人 株式会社東芝 发明人 野町 映子
分类号 H01L21/3205;H01L21/768;H01L23/522 主分类号 H01L21/3205
代理机构 代理人
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