| 摘要 |
In a charged-particle multi-beam processing apparatus for exposure of a target with a plurality of parallel particle-optical columns, each column has a beam shaping device (512) forming the shape of the illuminating beam (50) into a desired pattern composed of a multitude of sub-beams (51, 52), by means of an aperture array device (520), which defines the shape of a respective sub-beam by means of an array of apertures (24), and a deflection array device (520) selectively deflecting sub-beams (52) off their nominal paths; thus, only the non-selected sub-beams (51) can reach the target. According to the invention each beam shaping device (512) is provided with a first field-boundary device (510) and a second field-boundary device (540), which are the first and last plate elements traversed by the beam (50, 57). One of the first and second field-boundary devices defines a field-free space interval (h1, h2) so as to accommodate feeding lines (104) for controlling the deflection array device (520). |
