| 摘要 |
A process for surface treatment by dielectric barrier discharge (DBD) comprising the following operations:—feeding or passing a substrate into a reaction chamber (2), in which at least two electrodes (10, 12) and at least one counter-electrode (13, 14, 15) are positioned, wherein at least one dielectric barrier (16) is placed between these at least two electrodes (10, 12) and this at least one counter-electrode (13, 14, 15);—switching an inductance (L1, L2) in series with each of said electrodes (10, 12), wherein said inductances (L1, L2) are wound onto a common magnetic core in such a manner that the resulting magnetic flux of the two inductances is zero when identical currents circulate in the two electrodes (10, 12);—generating a high-frequency electric voltage of such a value that it causes the generation of a plasma between the at least two electrodes (10, 12) and the at least one counter-electrode (13, 14, 15);—feeding into the reaction chamber a mixture, the composition of which is such that on contact with the plasma, it breaks down and generates substances able to react with the surface of the substrate (4); |
