发明名称 |
PAIR OF ELECTRODES FOR DBD PLASMA PROCESS |
摘要 |
<p>The present invention concerns a device (10) for the surface treatment of a substrate (1) by dielectric barrier discharge that enables the generation of a cold filamentary plasma at atmospheric pressure, comprising a reaction chamber, in which are positioned means for supporting and/or moving the substrate (2) and at least two electrodes (3, 4) arranged in parallel on either side of the means for supporting and/or moving the substrate (2), of which one electrode (3) is intended to be brought to high voltage and a counter-electrode (4) to be earthed. It is characterised in that the counter-electrode (4) has a width (lce) and a length (Lce) that are respectively smaller than the width (le) and the length (Le) of the electrode (3), and in that the counter-electrode (4) is positioned so that it is enclosed in an orthogonal projection (5) of the electrode (3) on a plane containing the counter-electrode (4). The invention also concerns a surface treatment process, in particular for layer deposition, that calls for such a device.</p> |
申请公布号 |
EP2935648(A1) |
申请公布日期 |
2015.10.28 |
申请号 |
EP20130818466 |
申请日期 |
2013.12.18 |
申请人 |
ASAHI GLASS COMPANY, LIMITED |
发明人 |
TIXHON, M. ERIC;MICHEL, M. ERIC;LECLERCQ, M. JOSEPH |
分类号 |
C23C16/40;C03C17/00;C23C16/509;C23C16/54;H01J37/32 |
主分类号 |
C23C16/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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