| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an integrated type photo detector capable of accurately forming a mirror surface by including a structure capable of monitoring information (an angle and depth of a mirror surface formed by etching) on the progress of etching in a manufacturing process (an etching process).SOLUTION: A planar light wave circuit used for forming an integrated type photo detector includes: a surface scale 30 on an optical waveguide 17 (on a clad 14); and a core scale 32 being in the clad 14 and at the same height as that of a core 16. The surface scale 30 and the core scale 32 can be observed from the top surface of the planar light wave circuit.</p> |
