| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an imprint apparatus capable of improving alignment accuracy between a substrate and a mold by avoiding interference between an illumination system and a detection system regarding to the layout and by increasing a detection numerical aperture of the detection system that simultaneously detects marks formed on the substrate and on the mold.SOLUTION: An imprint method is provided for patterning an imprint material on a substrate by use of a mold. A mark formed on the substrate and a mark formed on the mold are irradiated with light; and the light from the mark formed on the substrate and from the mark formed on the mold is guided via a relay optical system by a detection system to a light-receiving element. A plane where an image of the substrate surface is formed by the relay optical system is present between the relay optical system and the detection system; the detection system is moved along the image formation plane to detect the mark formed on the mold and the mark formed on the substrate through the light-receiving element; and alignment between the substrate and the substrate is carried out based on the detection results.</p> |
