发明名称 Field plate trench transistor and method for producing it
摘要 A field plate trench transistor having a semiconductor body. In one embodiment the semiconductor has a trench structure and an electrode structure embedded in the trench structure. The electrode structure being electrically insulated from the semiconductor body by an insulation structure and having a gate electrode structure and a field electrode structure. The field plate trench transistor has a voltage divider configured such that the field electrode structure is set to a potential lying between source and drain potentials.
申请公布号 US9171841(B2) 申请公布日期 2015.10.27
申请号 US201414296665 申请日期 2014.06.05
申请人 Infineon Technologies Austria AG 发明人 Hirler Franz;Rieger Walter;Meyer Thorsten;Klein Wolfgang;Pfirsch Frank
分类号 H01L29/78;H01L27/07;H01L29/66;H01L29/732;H01L29/735;H01L29/861;H01L27/04;H01L29/06;H01L29/40;H01L29/423 主分类号 H01L29/78
代理机构 Dicke, Billig & Czaja, PLLC 代理人 Dicke, Billig & Czaja, PLLC
主权项 1. A semiconductor transistor including a field plate trench transistor comprising: a trench structure; a field electrode structure embedded in the trench structure, the field electrode structure being electrically insulated from a semiconductor body by an insulation structure; and a voltage divider between a source terminal and a drain terminal, the voltage divider including a series circuit comprising at least one resistor and at least one diode, the series circuit being connected between the source and drain terminals, wherein the field electrode structure is electrically connected to the voltage divider, and the at least one diode is a body substrate diode.
地址 Villach AT