发明名称 |
Phenol monomer, polymer for forming a resist underlayer film including same, and composition for a resist underlayer film including same |
摘要 |
A phenolic monomer used in the lithographic process for semiconductor fabrication, a polymer for preparing a resist under-layer comprising the same, and a resist under-layer composition comprising the same, are disclosed. The phenolic monomer is represented by the formula 1 of the specification, in Formula 1, R1, R2, R3, and R4 are independently a hydrogen atom, or a straight-chain, branched, monocyclic or polycyclic saturated or unsaturated hydrocarbon group having 1 to 20 carbon atoms with or without a hetero atom; A is a monocyclic or polycyclic aromatic hydrocarbon group having 4 to 20 carbon atoms; X is an oxygen atom (O) or a sulfur atom (S); and Y is a single bond, a methylene group (—CH2-), an oxygen atom (O), a sulfur atom (S), an amino group (—NH—), or two isolated hydrogen atoms, wherein A, R1, R2, R3, and R4 can be substituted with a straight-chain, branched, monocyclic or polycyclic saturated or unsaturated hydrocarbon group having 1 to 20 carbon atoms with or without a hetero atom; and either R1 and R2 or R3 and R4 are independently linked to each other to form a ring. |
申请公布号 |
US9170495(B2) |
申请公布日期 |
2015.10.27 |
申请号 |
US201214354978 |
申请日期 |
2012.11.01 |
申请人 |
DONGJIN SEMICHEM CO., LTD. |
发明人 |
Kim Jeong-Sik;Lee Jae-Woo;Kim Jae-Hyun |
分类号 |
G03F7/11;G03F7/09;C08G61/12;C07D311/86;C07D495/10;C07D491/107;C08G8/20;C09D161/12 |
主分类号 |
G03F7/11 |
代理机构 |
Park & Associates IP Law, P.C. |
代理人 |
Park & Associates IP Law, P.C. |
主权项 |
1. A polymer for preparing a resist under-layer, comprising a repeating unit represented by the following formula 2: wherein R1, R2, R3, R4 and R5 are independently a hydrogen atom, or a straight-chain, branched, monocyclic or polycyclic saturated or unsaturated hydrocarbon group having 1 to 20 carbon atoms with or without a hetero atom; A is a monocyclic or polycyclic aromatic hydrocarbon group having 4 to 20 carbon atoms; X is an oxygen atom (O) or a sulfur atom (S); and Y is a single bond, a methylene group (—CH2—), an oxygen atom (O), a sulfur atom (S), an amino group (—NH—), or two isolated hydrogen atoms, wherein A, R1, R2, R3, and R4 can be substituted with a straight-chain, branched, monocyclic or polycyclic saturated or unsaturated hydrocarbon group having 1 to 20 carbon atoms with or without a hetero atom; and either R1 and R2 or R3 and R4 are independently linked to each other to form a ring. |
地址 |
KR |