Layout generating method

摘要

A design layout generating method is provided. A design layout including a first pattern and a second pattern is provided to a computer system, wherein the first pattern and the second pattern meet a design rule of an integrated circuit, respectively. The first pattern and the second pattern are combined into a third pattern. Next, the third pattern is checked if it meets a definition of a weak pattern, wherein the weak pattern is a pattern that meets the design rule but still forms defects. Then, the third pattern is modified and a new design layout is generated.

主权项

1. A design layout generating method, comprising:
providing a design layout including a first pattern and a second pattern to a computer system, wherein the first pattern and the second pattern meet a design rule of an integrated circuit, respectively; combining the first pattern and the second pattern into a third pattern; checking if the third pattern meets a definition of a weak pattern, wherein the weak pattern is a pattern that meets the design rule but still forms defects; and modifying the third pattern and generating a new design layout.