Photomask, photomask set, exposure apparatus and exposure method

摘要

There is provided a photomask capable of improving alignment accuracy with respective photomasks disposed on the front and rear faces of a substrate. A photomask has a drawing pattern for exposure formed on one face opposing a substrate, a first alignment mark for alignment with a substrate side mark formed on the substrate, the first alignment mark being provided in a region of the one face, the region opposing the substrate when the substrate is retained and the drawing pattern is not formed in the region, and a second alignment mark for alignment with a third alignment mark provided on another photomask, the second alignment mark being provided in a region which does not oppose the substrate when the substrate is retained.

主权项

1. A photomask for use with another photomask and a flexible printed substrate having a photosensitive resist layer being provided on both front and rear faces of the flexible printed substrate, the photomask comprising:
a drawing pattern for exposure formed on one face opposing the flexible printed substrate; a first alignment mark for alignment with a substrate side mark formed on the flexible printed substrate, the first alignment mark being provided in a region of the one face, the region opposing the flexible printed substrate when the flexible printed substrate is retained and the drawing pattern is not formed in the region; and a second alignment mark for alignment with a third alignment mark provided on the another photomask opposing the other face of the flexible printed substrate, the second alignment mark being provided in a region which does not oppose the flexible printed substrate when the flexible printed substrate is retained.