Projection exposure apparatus with at least one manipulator

摘要

A projection exposure apparatus for microlithography includes a projection lens which includes a plurality of optical elements for imaging mask structures onto a substrate during an exposure process. The projection exposure apparatus also includes at least one manipulator configured to change, as part of a manipulator actuation, the optical effects of at least one of the optical elements within the projection lens by changing a state variable of the optical element along a predetermined travel. The projection exposure apparatus further includes an algorithm generator configured to generate a travel generating optimization algorithm, adapted to at least one predetermined imaging parameter, on the basis of the at least one predetermined imaging parameter.

主权项

1. An apparatus, comprising:
a projection lens comprising a plurality of optical elements configured to image mask structures onto a substrate during an exposure process, the plurality of optical elements comprising a first optical element; a manipulator configured to change, as part of a manipulator actuation, optical effects of the first optical element by changing a state variable of the first optical element along a predetermined travel; a first computing device configured to generate a travel algorithm based on at least one imaging parameter, the at least one imaging parameter comprising structure information with respect to mask structures to be imaged during a subsequent exposure process and/or structure information with respect to an angular distribution of exposure radiation radiated onto the mask structures during the subsequent exposure process; and a second computing device configured to establish a travel for a manipulator actuation based on the travel algorithm, wherein the apparatus is a microlithography projection exposure apparatus.