SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

摘要

A semiconductor device comprises: a semiconductor pattern; a first area penetrating the semiconductor pattern; a second area expanded from the first area wherein the thickness of the second area is thicker than the thickness of the first area; a first barrier pattern surrounding the semiconductor pattern on the first area; a material pattern located in the first barrier pattern wherein the material pattern has etch selectivity about the first barrier pattern; conductive films with conductive patterns on the second area; and contact plugs connected to the second area of each conductive film.