发明名称 MEMS device and method of forming the same
摘要 According to an exemplary embodiment, a method of forming a Micro Electro Mechanical System (MEMS) device is provided. The method includes the following operations: providing a substrate; forming a catalyst layer over the substrate; patterning the catalyst layer; forming a carbon nanotube based on the catalyst layer; forming a getter layer over the carbon nanotube and the substrate; and etching back the getter layer to expose the carbon nanotube. According to an exemplary embodiment, a method of forming a MEMS device is provided. The method includes the following operations: providing a substrate; forming a catalyst island over the substrate; heating the substrate and the catalyst island; contacting the catalyst island with a carbon-containing gas to form a carbon nanotube; forming a getter layer over the carbon nanotube and the substrate; and etching back the getter layer to expose the carbon nanotube.
申请公布号 US9169117(B1) 申请公布日期 2015.10.27
申请号 US201414261842 申请日期 2014.04.25
申请人 Taiwan Semiconductor Manufacturing Company Limited 发明人 Liang Chin-Wei;Tsai Cheng-Yuan;Tsai Chia-Shiung
分类号 H01L21/30;H01L21/46;B81C1/00;B81B7/00 主分类号 H01L21/30
代理机构 Jones Day 代理人 Jones Day
主权项 1. A method of forming a Micro Electro Mechanical System (MEMS) device, comprising: providing a substrate; forming a catalyst layer over the substrate; patterning the catalyst layer; forming a carbon nanotube based on the catalyst layer; forming a getter layer over the carbon nanotube and the substrate; and etching back the getter layer to expose the carbon nanotube.
地址 Hsinchu TW