发明名称 |
MEMS device and method of forming the same |
摘要 |
According to an exemplary embodiment, a method of forming a Micro Electro Mechanical System (MEMS) device is provided. The method includes the following operations: providing a substrate; forming a catalyst layer over the substrate; patterning the catalyst layer; forming a carbon nanotube based on the catalyst layer; forming a getter layer over the carbon nanotube and the substrate; and etching back the getter layer to expose the carbon nanotube. According to an exemplary embodiment, a method of forming a MEMS device is provided. The method includes the following operations: providing a substrate; forming a catalyst island over the substrate; heating the substrate and the catalyst island; contacting the catalyst island with a carbon-containing gas to form a carbon nanotube; forming a getter layer over the carbon nanotube and the substrate; and etching back the getter layer to expose the carbon nanotube. |
申请公布号 |
US9169117(B1) |
申请公布日期 |
2015.10.27 |
申请号 |
US201414261842 |
申请日期 |
2014.04.25 |
申请人 |
Taiwan Semiconductor Manufacturing Company Limited |
发明人 |
Liang Chin-Wei;Tsai Cheng-Yuan;Tsai Chia-Shiung |
分类号 |
H01L21/30;H01L21/46;B81C1/00;B81B7/00 |
主分类号 |
H01L21/30 |
代理机构 |
Jones Day |
代理人 |
Jones Day |
主权项 |
1. A method of forming a Micro Electro Mechanical System (MEMS) device, comprising:
providing a substrate; forming a catalyst layer over the substrate; patterning the catalyst layer; forming a carbon nanotube based on the catalyst layer; forming a getter layer over the carbon nanotube and the substrate; and etching back the getter layer to expose the carbon nanotube. |
地址 |
Hsinchu TW |