发明名称 |
SOI bipolar junction transistor with substrate bias voltages |
摘要 |
A circuit configuration and methods for controlling parameters of a bipolar junction transistor (BJT) fabricated on a substrate. A bias voltage is electrically coupled to the substrate and can be adjusted to alter the working parameters of a target BJT. |
申请公布号 |
US9171924(B2) |
申请公布日期 |
2015.10.27 |
申请号 |
US201414491978 |
申请日期 |
2014.09.19 |
申请人 |
GlobalFoundries U.S. 2 LLC |
发明人 |
Cai Jin;Ning Tak H. |
分类号 |
H01L29/66;H01L29/735;H01L29/739;H01L21/761;H01L29/73;H01L27/082;H01L27/12 |
主分类号 |
H01L29/66 |
代理机构 |
|
代理人 |
Tuchman Ido |
主权项 |
1. An integrated circuit comprising:
a substrate; a bipolar circuit fabricated on the substrate, the bipolar circuit including at least one npn BJT transistor and at least one pnp BJT transistor; a target bipolar transistor in the bipolar circuit; a controller configured to adjust a substrate bias voltage at the substrate; a doped well electrically isolating the target bipolar transistor from the substrate; and wherein the controller is further configured to adjust a well bias voltage to the doped well, the well bias voltage being different than the substrate bias voltage. |
地址 |
Hopewell Junction NY US |