发明名称 SOI bipolar junction transistor with substrate bias voltages
摘要 A circuit configuration and methods for controlling parameters of a bipolar junction transistor (BJT) fabricated on a substrate. A bias voltage is electrically coupled to the substrate and can be adjusted to alter the working parameters of a target BJT.
申请公布号 US9171924(B2) 申请公布日期 2015.10.27
申请号 US201414491978 申请日期 2014.09.19
申请人 GlobalFoundries U.S. 2 LLC 发明人 Cai Jin;Ning Tak H.
分类号 H01L29/66;H01L29/735;H01L29/739;H01L21/761;H01L29/73;H01L27/082;H01L27/12 主分类号 H01L29/66
代理机构 代理人 Tuchman Ido
主权项 1. An integrated circuit comprising: a substrate; a bipolar circuit fabricated on the substrate, the bipolar circuit including at least one npn BJT transistor and at least one pnp BJT transistor; a target bipolar transistor in the bipolar circuit; a controller configured to adjust a substrate bias voltage at the substrate; a doped well electrically isolating the target bipolar transistor from the substrate; and wherein the controller is further configured to adjust a well bias voltage to the doped well, the well bias voltage being different than the substrate bias voltage.
地址 Hopewell Junction NY US