| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for manufacturing at a high film forming rate a transparent conductive oxide thin film having a visible light permeability and an electric conductivity enhanced by suppressing damage from charged particles in plasma as much as possible.SOLUTION: A substrate S and a sputtering target T to form a transparent conductive oxide thin film are arranged facing each other in a vacuum vessel. The following treatments are simultaneously practiced. (i) Plasma is formed between the substrate S and the sputtering target T. (ii) A bias electric field is formed between the substrate S and the sputtering target T to accelerate charged particles in the plasma toward the surface of the sputtering target T. (iii) A high-frequency electromagnetic field is formed in the vicinity of the surface of the sputtering target T using a high-frequency antenna 16 to enhance the plasma density in the vicinity of the surface of the sputtering target T.</p> |
