| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a vacuum vapor deposition apparatus having a shutter exchange mechanism applicable to a linear evaporation source without generating radiant heat to an object to be vapor-deposited and without adding a dedicated drive part for the exchange of a shutter plate to which a vapor deposition material adheres.SOLUTION: A vacuum vapor deposition apparatus of the present invention includes a linear evaporation source having a plurality of nozzles in the longitudinal direction, and a shutter mechanism that causes opening/closing movement of a shutter plate to block a vapor deposition material evaporating from the evaporation source. The shutter mechanism includes a shutter base that supports the shutter plate, a shutter drive part that causes linear opening/closing movement of the shutter base on a plane vertical to a direction of evaporation and supply, shutter plate holding means that holds a plurality of the shutter plates laminated on the evaporation source side of the shutter base, and shutter base separation means that sequentially separates the shutter plates from the evaporation source side by movement on extension of opening movement.</p> |
