发明名称 |
SEMICONDUCTOR DEVICE |
摘要 |
A semiconductor device which uses a fin-type semiconductor layer to form a bipolar transistor. The substrate of the device is a semiconductor substrate. A collector is a first-conductivity type impurity region which is formed in the semiconductor substrate. A base is a second-conductivity type impurity region which is formed in the surface layer of the collector. A first semiconductor layer is a fin-type semiconductor layer which lies over the base. An emitter is formed in the first semiconductor layer and its bottom is coupled to the base. A first contact is coupled to the collector, a second contact is coupled to the base, and a third contact is coupled to the emitter. |
申请公布号 |
US2015303189(A1) |
申请公布日期 |
2015.10.22 |
申请号 |
US201514679051 |
申请日期 |
2015.04.06 |
申请人 |
Renesas Electronics Corporation |
发明人 |
SUZUKI Hisamitsu |
分类号 |
H01L27/06;H01L29/732;H01L29/08;H01L29/78 |
主分类号 |
H01L27/06 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor device comprising:
a semiconductor substrate; a first first-conductivity type region formed in the semiconductor substrate; a second-conductivity type region formed in a surface layer of the first first-conductivity type region; a first semiconductor layer located over the second-conductivity type region; a second first-conductivity type region formed in the first semiconductor layer with a bottom thereof coupled to the second-conductivity type region; a first contact coupled to the first first-conductivity type region; a second contact coupled to the second-conductivity type region; and a third contact coupled to the second first-conductivity type region. |
地址 |
Kanagawa JP |