发明名称 SEMICONDUCTOR INTERPOSER AND PACKAGE STRUCTURE HAVING THE SAME
摘要 A semiconductor interposer is provided, which includes: a substrate body having a surface defined with an inner area and a peripheral area around the inner area; a plurality of conductive posts embedded in the substrate body and each having one end exposed from the surface of the substrate body; a passivation layer formed on the surface of the substrate body and having a peripheral portion formed in the peripheral area, a plurality of ring-shaped portions formed around peripheries of the exposed ends of the conductive posts in the inner area and a plurality of strip-shaped portions formed between the ring-shaped portions for connecting the ring-shaped portions; and a UBM layer formed on the exposed end of each of the conductive posts and extending on the ring-shaped portion around the periphery of the exposed end of the conductive post, thereby effectively reducing stresses to prevent warping of the semiconductor interposer.
申请公布号 US2015303138(A1) 申请公布日期 2015.10.22
申请号 US201414515970 申请日期 2014.10.16
申请人 Siliconware Precision Industries Co., Ltd. 发明人 Tsai Jyun-Ling;Lu Chang-Lun
分类号 H01L23/498;H01L23/31;H01L23/00 主分类号 H01L23/498
代理机构 代理人
主权项 1. A semiconductor interposer, comprising: a substrate body having opposite first and second surfaces, wherein an inner area and a peripheral area around the inner area are defined on the second surface of the substrate body; a plurality of conductive posts embedded in the substrate body and each having one end exposed from the second surface of the substrate body; a passivation layer formed on the second surface of the substrate body, wherein the passivation layer has a peripheral portion formed in the peripheral area of the substrate body, a plurality of ring-shaped portions formed around peripheries of the exposed ends of the conductive posts in the inner area of the substrate body and a plurality of strip-shaped portions formed between the ring-shaped portions for connecting the ring-shaped portions; and a UBM (Under Bump Metallurgy) layer formed on the exposed end of each of the conductive posts and extending onto the ring-shaped portion around the periphery of the exposed end of the conductive post.
地址 Taichung TW