| 摘要 |
The present invention is to provide a ruthenium complex represented by formula (1a), (2), (3), etc., which is useful for producing a ruthenium-containing thin film both under the conditions using an oxidizing gas as the reaction gas and under the conditions using a reducing gas as the reaction gas:;;wherein R1a to R7a, R8, R9 and R10 to R18 represents an alkyl group having a carbon number of 1 to 6, etc., and n represents an integer of 0 to 2. |
| 主权项 |
1. A ruthenium complex represented by formula (A): wherein T represents CRA or a nitrogen atom; U represents an oxygen atom or CH; each of RA, RB, RC, RD, RE, RF, RG, RH and RI independently represents a hydrogen atom or an alkyl group having a carbon number of 1 to 6; m represents any one integer of 0, 1 and 3; and the pentahaptodienyl ligand β has a cyclic structure when m is 1 or 3, and has a non-cyclic structure when m is 0, provided that when m is 0, T is CRA, U is an oxygen atom, RF and RG are an alkyl group having a carbon number of 1 to 6, and RH and RI are a hydrogen atom, excluding a case where all of RA, RB, RC, RD and RE are a methyl group at the same time, that when m is 1, T is CRA, U is CH and RI is an alkyl group having a carbon number of 1 to 6, excluding a case where all of RF, RG and RH are a hydrogen atom at the same time and all of RA, RB, RC, RD, RE and RI are a methyl group at the same time, and that when m is 3, T is a nitrogen atom, U is CH, RB and RC are an alkyl group having a carbon number of 1 to 6, RD, RE, RF and RG are a hydrogen atom, and RH and RI are a hydrogen atom or a methyl group. |
