MONOMER FOR HARDMASK COMPOSITION, HARDMASK COMPOSITION INCLUDING SAID MONOMER, AND METHOD FOR FORMING PATTERN USING SAID HARDMASK COMPOSITION

摘要

Disclosed are a monomer represented by the following Chemical Formula 1 for a hardmask composition, a hardmask composition including the monomer, and a method of forming patterns using the same.;;In the above Chemical Formula 1, A, A′, L, L′, X and n are the same as defined in the specification.

主权项

1. A monomer for a hardmask composition, the monomer being represented by the following Chemical Formula 1: wherein, in the above Chemical Formula 1, A and A′ are each independently a substituted or unsubstituted C6 to C60 aromatic cyclic group, a substituted or unsubstituted C5 to C60 aliphatic cyclic group, a substituted or unsubstituted C2 to C60 heteroaromatic cyclic group, a substituted or unsubstituted C2 to C60 heteroaliphatic cyclic group, or a combination thereof, X is a hydrogen atom, an oxygen atom, a halogen atom, a hydroxy group, a thionyl group, a thiol group, a cyano group, a substituted or unsubstituted amino group, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C1 to C20 alkylamine group, or a substituted or unsubstituted C1 to C30 alkoxy group, L is a single bond or a double bond, L′ is a single bond or a substituted or unsubstituted C1 to C6 alkylene group, and n is an integer ranging from 1 to 3, provided that when X is an oxygen atom, L is a double bond; and when X is hydrogen, a halogen atom, a hydroxy group, a thionyl group, a thiol group, a cyano group, a substituted or unsubstituted amino group, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C1 to C20 alkylamine group, or a substituted or unsubstituted C1 to C30 alkoxy group, L is a single bond.