METHOD FOR REPAIRING DISPLAY SUBSTRATE, DISPLAY SUBSTRATE AND DISPLAY APPARATUS

摘要

A method for repairing a display substrate, comprising steps of: forming a black matrix pattern on a substrate, wherein there is a first pattern missing region in the black matrix pattern; forming a color filter layer pattern on the substrate on which the black matrix pattern is formed; removing all patterns from the substrate within the first pattern missing region by laser processing the first pattern missing region of the substrate based on a position of the first pattern missing region; and filling a first repair material into the first pattern missing region of the substrate processed by laser so as to repair the first pattern missing region. The present invention also discloses a display substrate and a display apparatus.

主权项

1. A method for repairing a display substrate, comprising steps of:
forming a black matrix pattern on a substrate, wherein there is a first pattern missed region in the formed black matrix pattern; detecting and marking the first pattern missed region and the position thereof in the black matrix pattern before the step of forming a color filter layer pattern on the substrate on which the black matrix pattern is formed; forming a color filter layer pattern on the substrate on which the black matrix pattern is formed; removing all patterns provided within the first pattern missed region from the substrate by laser processing the first pattern missed region of the substrate based on a position of the first pattern missed region; and filling a first repair material within the first pattern missed region of the substrate processed by laser so as to repair the first pattern missed region, wherein there is a first pattern redundant region in the formed black matrix pattern, and the method further comprising steps of: detecting and marking the first pattern redundant region and the position thereof in the black matrix pattern before the step of forming a color filter layer pattern on the substrate on which the black matrix pattern is formed; and removing all patterns provided within the first pattern redundant region from the substrate By laser processing the first pattern redundant region of the substrate based on a portion of the first pattern redundant region, wherein the step of detecting and marking the first pattern missed region and the position thereof, and the step of detecting and marking the first pattern redundant region and the position thereof are simultaneously performed in one detection process.