发明名称 WIRING STRUCTURE AND MANUFACTURING METHOD THEREFOR
摘要 <p>PROBLEM TO BE SOLVED: To provide a wiring structure capable of suppressing decrease in the reliability of wiring.SOLUTION: A wiring structure includes a first insulating layer 109 formed on a first conductive layer, a first connection hole 119b formed in the first insulating layer and located above the first conductive layer, a second conductive layer 122 formed on the bottom surface and the inner side face of the first connection hole, a second insulating layer 123 buried on the inside of the second conductive layer in the first connection hole, and first wiring 126 formed on the second conductive layer and second insulating layer.</p>
申请公布号 JP2015185792(A) 申请公布日期 2015.10.22
申请号 JP20140063227 申请日期 2014.03.26
申请人 SEIKO EPSON CORP 发明人 YAMANAKA HIDEICHIRO
分类号 H01L21/768;H01L23/522 主分类号 H01L21/768
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