| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an exposure method capable of reducing the man-hours, the time and the number of masks required for exposing a stereoscopic workpiece.SOLUTION: The exposure method of the stereoscopic workpiece includes the steps of: disposing a reflective diffraction grating plate with which a one-dimensional diffraction grating pattern is formed that has a depth dimensionλ/4 (λ: wavelength of exposure light) for cancelling 0-order diffraction light correspondently to a wavelength of exposure light used for a projective exposure device at a workpiece mounting position on a workpiece mounting stage in the exposure device; mounting a stereoscopic workpiece on the reflective diffraction grating plate; installing, in a reticle mask holding part of the exposure device, a reticle mask with which an exposure pattern is formed so as to correspond to an exposed side face of the stereoscopic workpiece; aligning the stereoscopic workpiece with the exposure pattern passing through the reticle mask; and projecting the stereoscopic workpiece with exposure light from a light source of the exposure device through the reticle mask.</p> |
