REACTION TUBE, SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a reaction chamber structure that is good in evacuation efficiency and also good in uniformity of in-plane and inter-plane film thickness, film quality, and electric characteristics of a processed substrate while enhancing gas supply efficiency.SOLUTION: There is provided a reaction tube which forms a processing chamber in which a plurality of substrates are processed by making a predetermined raw material react inside. The reaction tube has an outer tube which is formed cylindrically and has its upper end closed and its lower end opened, and an inner tube which is provided in the outer tube and provided with at least one exhaust slit for discharging the predetermined raw material gas in each of a substrate array region where the plurality of substrates are arrayed and a region below the substrate array region.