| 摘要 |
A method of lithographically transferring a pattern on a light sensitive surface in a multiple exposure process comprises the following steps:
a) providing a mask comprising a first mask pattern area and a second mask pattern area;b) directing projection light on the mask, thereby producing on the light sensitive surface a first exposed pattern area, which is an image of the first mask pattern area, and a second exposed pattern area, which is an image of the second mask pattern area. The projection light illuminating the first and second mask pattern area has different angular light distributions.c) repeating step b) using the same mask so that an image of the first mask pattern area is superimposed on the second exposure pattern area. |
