| 发明名称 |
CLEANING SOLUTION COMPOSITION AND METHOD OF CLEANING SEMICONDUCTOR DEVICE USING THE SAME |
| 摘要 |
A cleaning solution composition includes an organic solvent in which a metal fluoride does not dissolve, at least one fluoride compound that generates bifluoride (HF2−), and deionized water, wherein the deionized water may be included in a concentration of 1.5 wt % or lower based on the total weight of the cleaning solution composition. |
| 申请公布号 |
US2015299629(A1) |
申请公布日期 |
2015.10.22 |
| 申请号 |
US201414542973 |
申请日期 |
2014.11.17 |
| 申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
Bae Sang-Won;Ko Yong-Sun;Kim Seok-Hoon;Kim In-Gi;Oh Jung-Min;Lee Kun-Tack;Lee Hyo-San;Jeong Ji-Hoon;Cho Yong-Jhin |
| 分类号 |
C11D11/00;C11D7/08;C11D7/50;H01L21/02 |
主分类号 |
C11D11/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A cleaning solution composition, comprising:
an organic solvent in which a metal fluoride does not dissolve; at least one fluoride compound that generates bifluoride (HF2−); and deionized water, wherein the deionized water is present in a concentration of 1.5 wt % or less based on the total weight of the cleaning solution composition. |
| 地址 |
Suwon-si KR |
