发明名称 BOLOMETER TYPE INFRARED SENSOR AND MANUFACTURING METHOD THEREOF
摘要 <p>PROBLEM TO BE SOLVED: To provide a bolometer type infrared sensor that can provide a high TCR even if the film formation temperature of vanadium oxide is 400°C or less.SOLUTION: A VOfilm 2 to be a resistor film having the rutile structure is provided by the epitaxial growth on a surface of a TiOfilm 1 to be an undercoat insulator film having the rutile structure. Such formation of the VOfilm having the rutile structure by the epitaxial growth on the TiOfilm 1 having the rutile structure can provide a high TCR even if the film formation temperature of the VOfilm is 400°C or less.</p>
申请公布号 JP2015184187(A) 申请公布日期 2015.10.22
申请号 JP20140062073 申请日期 2014.03.25
申请人 DENSO CORP;NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY 发明人 MIYAZAKI KENICHI;SUZUKI YOSHIMI;WADO HIROYUKI;SHIBUYA KEISUKE;SAWA AKIHITO
分类号 G01J1/02;G01J5/20 主分类号 G01J1/02
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