发明名称 |
BOLOMETER TYPE INFRARED SENSOR AND MANUFACTURING METHOD THEREOF |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a bolometer type infrared sensor that can provide a high TCR even if the film formation temperature of vanadium oxide is 400°C or less.SOLUTION: A VOfilm 2 to be a resistor film having the rutile structure is provided by the epitaxial growth on a surface of a TiOfilm 1 to be an undercoat insulator film having the rutile structure. Such formation of the VOfilm having the rutile structure by the epitaxial growth on the TiOfilm 1 having the rutile structure can provide a high TCR even if the film formation temperature of the VOfilm is 400°C or less.</p> |
申请公布号 |
JP2015184187(A) |
申请公布日期 |
2015.10.22 |
申请号 |
JP20140062073 |
申请日期 |
2014.03.25 |
申请人 |
DENSO CORP;NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY |
发明人 |
MIYAZAKI KENICHI;SUZUKI YOSHIMI;WADO HIROYUKI;SHIBUYA KEISUKE;SAWA AKIHITO |
分类号 |
G01J1/02;G01J5/20 |
主分类号 |
G01J1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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