| 摘要 |
<p>PROBLEM TO BE SOLVED: To improve the cleaning efficiency in a substrate cleaning technique of cleaning one principal surface of a substrate by supplying liquid alternately receiving application and application stop of an ultrasonic wave to the one principal surface.SOLUTION: A substrate cleaning device comprises: a nozzle which discharges liquid toward one principal surface of a substrate from the outer side of a plurality of holding parts contacting a peripheral edge part of the substrate; a vibrator which is provided in the nozzle; an oscillator which outputs to the vibrator an oscillation signal of alternately switching an ON signal for oscillating the vibrator and an OFF signal for stopping the oscillation of the vibrator to control application and application stop of the ultrasonic wave to the liquid; and a movement mechanism which concentrically moves at least one of the plurality of holding parts and the nozzle around the rotation center of the substrate held by the plurality of holding parts to rotationally move the substrate relatively with respect to the nozzle. The OFF signal is given from the oscillator to the vibrator in accordance with the timing at which the holding parts are positioned between the nozzle and the one principal surface of the substrate and the liquid discharged from the nozzle is supplied to the holding parts.</p> |
