| 发明名称 |
METHOD FOR SUPPLYING INERT GAS TO STB IN SEMICONDUCTOR WAFER PRODUCTION SYSTEM AND SEMICONDUCTOR WAFER PRODUCTION SYSTEM USING THE SAME |
| 摘要 |
The present invention relates to a method for supplying inert gas to an STB in a semiconductor wafer production system that includes a step of sensing that a FOUP is loading on the STB and generating a first input signal, and a step of opening a valve for inert gas and supplying nitrogen gas to the FOUP based on the first input signal, and to a semiconductor wafer production system using the method. |
| 申请公布号 |
US2015303086(A1) |
申请公布日期 |
2015.10.22 |
| 申请号 |
US201314395956 |
申请日期 |
2013.10.07 |
| 申请人 |
Daifuku Co., Ltd. |
发明人 |
Yoo Dong Gyu;Lee Jae Hyun;Lee Jun Han;Jeong Ui Han |
| 分类号 |
H01L21/673 |
主分类号 |
H01L21/673 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for supplying inert gas to an STB in a semiconductor wafer production system, the method comprising:
a step of sensing that a FOUP is loading on the STB and generating a first input signal; and a step of opening a valve for inert gas and supplying nitrogen gas to the FOUP based on the first input signal. |
| 地址 |
Osaka-shi JP |
