| 发明名称 |
SUSCEPTOR PROCESSING METHOD AND SUSCEPTOR PROCESSING PLATE |
| 摘要 |
A susceptor processing method according to an embodiment includes: placing a plate on a susceptor arranged in a film forming chamber; heating the susceptor in order to have a temperature higher than that of the plate by using a main heater arranged below the susceptor and an auxiliary heater arranged in an upper part of the film forming chamber, and subliming a SIC film having been formed on a surface of the susceptor and adhering the sublimed SIC on the plate; and transporting the plate from the film forming chamber, the plate having SIC adhered thereon. |
| 申请公布号 |
US2015299898(A1) |
申请公布日期 |
2015.10.22 |
| 申请号 |
US201514677410 |
申请日期 |
2015.04.02 |
| 申请人 |
NuFlare Technology, Inc. |
发明人 |
ITO Hideki;Tsuchida Hidekazu;Kamata Isaho;Ito Masahiko;Fujibayashi Hiroaki;Suzuki Katsumi;Nishikawa Koichi |
| 分类号 |
C30B25/12;C30B29/36;C30B23/02 |
主分类号 |
C30B25/12 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A susceptor processing method comprising:
placing a plate on a susceptor arranged in a film forming chamber; heating the susceptor in order to have a temperature higher than that of the plate by using a main heater arranged below the susceptor and an auxiliary heater arranged in an upper part of the film forming chamber, and subliming a SIC film having been formed on a surface of the susceptor and adhering the sublimed SIC on the plate; and transporting the plate from the film forming chamber, the plate having SIC adhered thereon. |
| 地址 |
Yokohama-Shi JP |
