发明名称 |
SUBSTRATE LOADING IN AN ALD REACTOR |
摘要 |
An apparatus and method for loading a plurality of substrates into a substrate holder in a loading chamber of a deposition reactor to form a vertical stack of horizontally oriented substrates within said substrate holder, for turning the substrate holder to form a horizontal stack of vertically oriented substrates, and for lowering the substrate holder into a reaction chamber of the deposition reactor for deposition. The technical effects achieved are: a top loading system for a vertical flow deposition reactor in which the substrates can be loaded with horizontal orientation, eliminating the need for flipping each substrate separately by flipping the whole substrate holder and minimizing a loading distance in a reactor cluster. |
申请公布号 |
US2015299859(A1) |
申请公布日期 |
2015.10.22 |
申请号 |
US201214646504 |
申请日期 |
2012.11.23 |
申请人 |
PICOSUN OY |
发明人 |
KILPI Vaino;KOSTAMO Juhana;LI Wei-Min |
分类号 |
C23C16/455;C23C16/458 |
主分类号 |
C23C16/455 |
代理机构 |
|
代理人 |
|
主权项 |
1. A method comprising:
loading a plurality of substrates into a substrate holder in a loading chamber of a deposition reactor to form a vertical stack of horizontally oriented substrates within said substrate holder; and turning the substrate holder to form a horizontal stack of vertically oriented substrates and lowering the substrate holder into a reaction chamber of the deposition reactor for deposition. |
地址 |
ESPoo FI |