发明名称 SUBSTRATE LOADING IN AN ALD REACTOR
摘要 An apparatus and method for loading a plurality of substrates into a substrate holder in a loading chamber of a deposition reactor to form a vertical stack of horizontally oriented substrates within said substrate holder, for turning the substrate holder to form a horizontal stack of vertically oriented substrates, and for lowering the substrate holder into a reaction chamber of the deposition reactor for deposition. The technical effects achieved are: a top loading system for a vertical flow deposition reactor in which the substrates can be loaded with horizontal orientation, eliminating the need for flipping each substrate separately by flipping the whole substrate holder and minimizing a loading distance in a reactor cluster.
申请公布号 US2015299859(A1) 申请公布日期 2015.10.22
申请号 US201214646504 申请日期 2012.11.23
申请人 PICOSUN OY 发明人 KILPI Vaino;KOSTAMO Juhana;LI Wei-Min
分类号 C23C16/455;C23C16/458 主分类号 C23C16/455
代理机构 代理人
主权项 1. A method comprising: loading a plurality of substrates into a substrate holder in a loading chamber of a deposition reactor to form a vertical stack of horizontally oriented substrates within said substrate holder; and turning the substrate holder to form a horizontal stack of vertically oriented substrates and lowering the substrate holder into a reaction chamber of the deposition reactor for deposition.
地址 ESPoo FI