发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To inhibit the chemical atmosphere from being dispersed around a processing tank.SOLUTION: A substrate processing apparatus includes: a processing tank in which a substrate retained in a substrate holder is housed and which is used for processing the substrate; a lifter which supports the substrate holder and is constituted so that the substrate holder is housed in the processing tank and is taken out from the processing tank; and a cover is constituted so as to cover the periphery of the substrate holder taken out from the processing tank with the lifter.</p>
申请公布号 JP2015185632(A) 申请公布日期 2015.10.22
申请号 JP20140059566 申请日期 2014.03.24
申请人 EBARA CORP 发明人 KOBAYASHI KENICHI;SEKIMOTO MASAHIKO;YOKOYAMA TOSHIO;AKAZAWA KENICHI;KURASHINA KEIICHI;MITSUYA TAKASHI
分类号 H01L21/677;H01L21/306 主分类号 H01L21/677
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