发明名称 |
SUBSTRATE PROCESSING APPARATUS |
摘要 |
<p>PROBLEM TO BE SOLVED: To inhibit the chemical atmosphere from being dispersed around a processing tank.SOLUTION: A substrate processing apparatus includes: a processing tank in which a substrate retained in a substrate holder is housed and which is used for processing the substrate; a lifter which supports the substrate holder and is constituted so that the substrate holder is housed in the processing tank and is taken out from the processing tank; and a cover is constituted so as to cover the periphery of the substrate holder taken out from the processing tank with the lifter.</p> |
申请公布号 |
JP2015185632(A) |
申请公布日期 |
2015.10.22 |
申请号 |
JP20140059566 |
申请日期 |
2014.03.24 |
申请人 |
EBARA CORP |
发明人 |
KOBAYASHI KENICHI;SEKIMOTO MASAHIKO;YOKOYAMA TOSHIO;AKAZAWA KENICHI;KURASHINA KEIICHI;MITSUYA TAKASHI |
分类号 |
H01L21/677;H01L21/306 |
主分类号 |
H01L21/677 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|