发明名称 LOW TOXICITY SOLVENT SYSTEM FOR POLYAMIDEIMIDE AND POLYAMIDE AMIC ACID RESIN MANUFACTURE
摘要 Techniques and mechanisms to reduce toxicity in manufacturing of a polyamideimide and polyamide amic acid resin polymer. In an embodiment, a polyamideimide is produced using at least one aprotic dialkylamide solvent and at least one co-solvent. In another embodiment, the at least one co-solvent is selected from the group consisting of methyl actetate, n-propyl acetate, t-butyl acetate, iso-butyl acetate, ethyl acetate, isopropyl acetate, methyl lactate, ethyl lactate, n-propyl lactate, isopropyl lactate, n-butyl lactate, isobutyl lactate, t-butyl lactate, cyclohexanone, cyclopentanone, n-butyl acetate, methyl alcohol, ethyl alcohol, isopropyl alcohol, n-acetyl morpholine, ε-caprolactone and methylcyclohexane.
申请公布号 WO2015161107(A1) 申请公布日期 2015.10.22
申请号 WO2015US26224 申请日期 2015.04.16
申请人 FUJIFILM HUNT CHEMICALS US, INC.;KELLY, CARISSA M.;NOGA, DAVID E.;SIDENSTICK, JOHN E.;BEN-ASHER, LIMOR;KONDO, ATSUO 发明人 KELLY, CARISSA M.;NOGA, DAVID E.;SIDENSTICK, JOHN E.;BEN-ASHER, LIMOR;KONDO, ATSUO
分类号 C09D179/08;C08G73/10;C08G73/14 主分类号 C09D179/08
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