| 摘要 |
The present invention relates to a device having a reactor (3). According to the present invention, different process gases can be provided in different process steps into the reactor (3), and the reaction (3) includes an exhaust gas line (5). Through the exhaust gas line, in different process steps, the different exhaust gases are discharged to the outside from the reactor (3). The device comprises: a first exhaust gas device and second exhaust gas device (10 and 20) which can be fluidically connected to the exhaust gas line (5) by means of valve assemblies (11 and 21), and which can be separated from the exhaust gas line (5); purification members (18 and 28) for treating exhaust gas generated from different process steps; compensation gas supplying gas supply devices (12 and 22) disposed between the valve assemblies (11 and 21) and each of the purification members (18 and 28); and pressure sensors (13 and 23) for measuring each total pressure (P_F and P_T) in each of the exhaust gas devices (10 and 20). An adjusting device (9) is provided, and an adjustment variable of the adjusting device (9) is a difference in pressure between values of the total pressure (P_F and P_T) in the exhaust gas devices (10 and 20). The adjusting device is designed to be adjusted to zero when the valve assemblies (11 and 21) are converted even when the difference in pressure is low. |
