| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a start-up method of a thin film formation device in which generation of particles can be suppressed efficiently, and to provide a thin film formation device.SOLUTION: A start-up method of a thin film formation device where a quarts tube constituting a reaction chamber housing a workpiece is replaced, includes an ozone cycle purge step and a pre-coating step. The ozone cycle purge step performs cycle purge using ozone in the reaction tube of the thin film formation device where the quarts tube is set. In the pre-coating step, film-forming gas is supplied into the reaction chamber, on condition that a thin film is formed on the work piece, subsequent to the ozone cycle purge step.</p> |
