| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a production method of a resin film that is suitably used for nanoimprinting.SOLUTION: The production method of a resin film includes: a first step of applying a resin varnish comprising a photocurable resin monomer and a solvent on a surface of a substrate; a second step of removing the solvent in the resin varnish and then irradiating the varnish with light to cure the photocurable resin monomer to form a resin layer; and a third step of peeling the resin layer from the substrate. A surface free energy E1 of the resin varnish and a surface free energy E2 of the substrate surface in the first step satisfy E1≤E2; and the above E2 and a surface free energy E3 of the resin film on a joint face to the substrate surface in the third step satisfy E2≤35 (mN/m) and E3≤35 (mN/m).</p> |
