发明名称 METHOD AND APPARATUS FOR CURING THIN FILMS ON LOW-TEMPERATURE SUBSTRATES AT HIGH SPEEDS
摘要 A curing apparatus for thermally processing thin films on low-temperature substrates at high speeds is disclosed. The curing apparatus includes a strobe head, a strobe control module and a conveyor control module. The strobe control module controls the power, duration and repetition rate of a set of pulses generated by a flash lamp on the strobe head. The conveyor control module along with the strobe control module provide real-time synchronization between the repetition rate of the set of pulses and the speed at which the substrate is being moved under the strobe head, according to the speed information.
申请公布号 US2015298167(A1) 申请公布日期 2015.10.22
申请号 US201514754044 申请日期 2015.06.29
申请人 NCC NANO, LLC 发明人 SCHRODER KURT A.;MARTIN KARL M.;JACKSON DOUG K.;MCCOOL STEVEN C.
分类号 B05D3/06 主分类号 B05D3/06
代理机构 代理人
主权项 1. A method for curing thin films on low-temperature substrates, said method comprising: providing a thermal barrier layer between a thin film and a substrate; generating a plurality of pulses via a flash lamp at a predetermined power, duration and repetition rate; and transporting said thin film, said thermal barrier layer and said substrate pass said flash lamp such that said thin film located on said thermal barrier layer is cured by said plurality of pulses from said flash lamp.
地址 Dallas TX US