发明名称 PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING CELL CULTURE SUBSTRATE
摘要 Provided are: a photosensitive resin composition for cell culture substrates that enables the low-cost manufacture of a cell culture substrate, that can easily form patterns of various shapes when providing a pattern on the surface of a cell culture substrate, that has low cytotoxicity, and that can form a cell culture substrate with which cells can be cultured well; a cell culture substrate that is formed using the photosensitive resin composition; and a cell culture substrate manufacturing method that uses the photosensitive resin composition. In the photosensitive resin composition, which includes a photopolymerizible monomer (A) and a photopolymerization initiator (B), the photopolymerizible monomer (A) used contains a defined amount of a polyfunctional monomer (A1) that is at least trifunctional, and the content of the photopolymerization initiator (B) is within a prescribed range.
申请公布号 WO2015159821(A1) 申请公布日期 2015.10.22
申请号 WO2015JP61251 申请日期 2015.04.10
申请人 TOKYO OHKA KOGYO CO., LTD. 发明人 SENZAKI, TAKAHIRO
分类号 C12M1/00;B29C41/12;C08F2/46;C08J7/00 主分类号 C12M1/00
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