发明名称 SCRATCH AND FINGERPRINT RESISTANT ANTI-REFLECTIVE FILMS FOR USE ON DISPLAY WINDOWS OF ELECTRONIC DEVICES AND OTHER RELATED TECHNOLOGY
摘要 A scratch-resistant anti-reflective film in accordance with a particular embodiment includes an anti-reflective stack and a protective layer overlying the anti-reflective stack. The anti-reflective stack has at least six stack layers of alternating higher and lower refractive indexes. The protective layer is at least primarily composed of diamond-like carbon and has a thickness of not more than 5 nm. At least a 15 cm2 region of the film is continuous and has an average nanoindentation hardness of at least 8 GPa using the Continuous Stiffness Measurement Technique. An average reflectance off the film at the region from normal incident light of wavelengths from 425 nm to 675 nm is not more than 1%. Average a* and b* in CIELAB color space for reflectance off the film at the region from −45° to 45° incident visible light are within a range from −2.0 to 2.0.
申请公布号 US2015299470(A1) 申请公布日期 2015.10.22
申请号 US201514699963 申请日期 2015.04.29
申请人 General Plasma, Inc. 发明人 Ngo Phong;Madocks John
分类号 C09D5/00;G06F1/16;G06F3/041 主分类号 C09D5/00
代理机构 代理人
主权项 1. A scratch-resistant anti-reflective film, comprising: an anti-reflective stack including successively stacked first, second, third, fourth, fifth, and sixth stack layers of alternating higher and lower refractive indexes; and a protective layer overlying the anti-reflective stack, the protective layer being at least primarily composed of diamond-like carbon and having a thickness of not more than 5 nm, wherein— at least a 15 cm2 region of the film is continuous,average reflectance off the film at the region from normal incident light of wavelengths from 425 nm to 675 nm is not more than 1%,average a* and b* in CIELAB color space for reflectance off the film at the region from −45° to 45° incident light of wavelengths from 425 nm to 675 nm are within a range from −2.0 to 2.0, andthe film has an average nanoindentation hardness at the region of at least 8 GPa using the Continuous Stiffness Measurement Technique.
地址 Tucson AZ US