| 摘要 |
PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition which achieves formation of a pattern excellent in exposure latitude (EL) and a pattern shape in the formation of a fine pattern having a small space width (for example, in an order of several tens nanometers), in particular, which achieves formation of a fine isolated space pattern that is difficult to form by alkali development, and to provide a resist film, a pattern forming method, a method for manufacturing an electronic device and an electronic device using the above composition.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition comprises a compound expressed by general formula (X) shown below. In the general formula, P represents at least one group selected from a unit consisting of groups expressed by general formulae (I) to (IV) shown below. When a plurality of P is present, a plurality of P may be the same or different from each other. |
