| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an exposure unit that can more efficiently perform exposure of a plurality of substrates to shorten the tact time, and an exposure method using the unit. <P>SOLUTION: An exposure unit 10 comprises an exposure device 11, first and second transportation devices 12 and 13, and a control unit 20. The exposure device 11 includes: a mask stage 21 for holding a mask M; a substrate stage 24 including first and second work chucks 22 and 23 for holding substrates W1 and W2, respectively; a stage movement mechanism 25 capable of moving the first and second work chucks 22 and 23 in synchronization so that the substrates W1 and W2 held by the first and second work chucks 22 and 23 face the mask M; and an illumination optical system for irradiating the substrates W1 and W2 with light through the mask M. The first and second transportation devices 12 and 13 hold the substrates W1 and W2, respectively and carry the substrates W1 and W2 in and out of the first and second work chucks 22 and 23. The control unit 20 controls the first and second transportation devices 12 and 13 so that the carrying operations of the substrates W1 and W2 are performed in synchronization. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
