发明名称 |
An apparatus for performing a plasma chemical vapour deposition process |
摘要 |
The invention relates to an apparatus for performing a plasma chemical vapour deposition process. The apparatus comprises a mainly cylindrical resonator being provided with an outer cylindrical wall enclosing a resonant cavity extending in a circumferential direction around a cylindrical axis. The resonator is further provided with side wall portions bounding the resonant cavity in the cylindrical direction, and with a slit configuration extending in a circumferential direction around the cylindrical axis providing access from the resonant cavity radially inwardly. Further, the slit configuration includes slit sections that are mutually offset in the cylindrical direction. |
申请公布号 |
EP2605267(A3) |
申请公布日期 |
2015.10.21 |
申请号 |
EP20120197212 |
申请日期 |
2012.12.14 |
申请人 |
DRAKA COMTEQ B.V. |
发明人 |
MILICEVIC, IGOR;VAN STRALEN, MATTHEUS JACOBUS NICOLAAS;HARTSUIKER, JOHANNES ANTOON |
分类号 |
H01J37/32;C03B37/018 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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